Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for ...

Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...

A new technical paper titled “Statistics of EUV exposed nanopatterns: Photons to molecular dissolutions” was published by Hiroshi Fukuda, Hitachi High-Tech Corporation. “For higher computing power of ...

The first full-scale prototype machine for making ICs by using extreme-ultraviolet (EUV) light has been completed, proving that the technology works. This breakthrough should lead to microprocessors ...

A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by Lawrence Livermore National Laboratory (LLNL), the project aims for ...

China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They had a semiconductor Manhattan Project”. The prototype was completed in early ...

A panel representing all aspects of the lithographic ecosystem talked about the future of EUV lithography on February 28th, during the SPIE Advanced Lithography + Patterning conference, in San Jose, ...

New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...

SAN JOSE, Calif., Feb. 26, 2024 (GLOBE NEWSWIRE) -- Today at the SPIE Advanced Lithography + Patterning conference, Applied Materials, Inc. introduced a portfolio of products and solutions designed to ...

A new center led by Lawrence Berkeley National Laboratory (Berkeley Lab) could accelerate the next revolution in microchips, the tiny silicon components used in everything from smartphones to smart ...