The groundbreaking discovery could open new doors for other researchers working with delicate materials such as cell membranes. (Nanowerk News) Imagine drawing on something as delicate as a living ...
SAN JOSE — KLA-Tencor Corp. today announced the addition of an etch modeling and analysis module to its Prolith lithography simulation and modeling software to help users accelerate advanced ...
The research team proposed a method called aberration-converged annular lithography (ACAL) system, as schematic diagram shown in Figure 1. The Gaussian beam is converted into a collimated annular beam ...
August 26, 2014. Today, KLA-Tencor Corp. introduced the WaferSight PWG patterned wafer geometry measurement system, the LMS IPRO6 reticle pattern placement metrology system and the K-T Analyzer 9.0 ...
What Is Electron Beam Lithography? Electron beam lithography (EBL) is a technique for creating high-resolution patterns on a semiconductor substrate by directing a beam of electrons to selectively ...
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