Traditional lithography remains a standard in the industry, providing precision and a relatively cost-effective way to create patterns on the wafer when producing very high volumes of chips. However, ...
At the forefront of Europe’s photonics innovation, TNO is building a state-of-the-art pilot line for Indium Phosphide (InP) photonic chips at the High Tech Campus in Eindhoven. As part of the ...
The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...
Semiconductor Engineering sat down to discuss lithography and photomask technologies with Greg McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...
The new industry-grade 100 kV electron beam writer which will be located on CU Boulder's campus. A state-of-the-art instrument coming soon to CU Boulder will improve research around quantum ...
To most sensible physical design folks, the mysteries of operating and tuning lithography systems are just that: mysteries. You put in a set of patterns on the masks, and you get out a set of patterns ...
LLNL researchers break barriers in 3D nanofabrication - transforming two-photon lithography (TPL) into a wafer-scale ...
Keith Best, Noel Technologies' new director of photolithography. Click here for high-resolution version CAMPBELL, CA--(Marketwired - May 16, 2013) - Noel Technologies, a Silicon Valley technology ...
We present a method for submicron fabrication of flexible, thin-film structures fully encapsulated in biocompatible polymer poly(chloro-p-xylylene) (Parylene C) that ...
Redirecting to: https://www.colorado.edu/engineering/2022/09/07/nsf-funds-new-electron-beam-lithography-system-quantum-engineering-nanofabrication ...
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